Picture of Mask aligner Suss MA6
Current status:
AVAILABLE
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Mask aligner is designed to accurately align masks with substrates enabling photlitography.

Technical data:

  • 350 W exposure lamp, Hg
  • Alignment mode: Top side
  • Substrate thickness up to 6 mm.
  • Exposure modes: Proximity, soft contact, hard contact, vacuum contact.

Chucks:

  • 1" square chuck for pieces at least 10x10 mm up to substrates 1"x1".
  • 2x2" square
  • 4" (100 mm) wafer

Mask holders:

  • 2 inch for 
  • 3 inch, possible to use proximity flags
  • 5 inch, possibility to use proximity flags

Filters:

  • i-line filter
  • ND33 filter

Objective:

  • 5x
  • 7.5 offset
Tool name:
Mask aligner Suss MA6
Area/room:
CLR - 123
Category:
Lithography
Manufacturer:
Suss Microtec
Model:
MA/BA6 Gen4
Tool rate:
A
Max booking time, day:
hours
Max booking time, night:
hours
No. of future bookings:

Instructors

Licensed Users

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