Picture of PVD HIPIMS plasma deposition device
Current status:
AVAILABLE
Book | Log
Show/Collapse all

1st Responsible:
2nd Responsible:
You must be logged in to view files.

Multifunctional Equipment for Vacuum Coatings Deposition G500M.2 is intended for deposition of various functional coatings on samples using magnetron sputtering, including HiPIMS, for R&D works.  The Machine is a batch operating system with sample loading before start of the cycle and (coated) sample unloading when the cycle is completed. The control system ensures control of all equipment of the Machine in compliance with the manually set process algorithm. The Machine is intended for operation in standard environment, i.e., in facility that corresponds with vacuum requirements. Ambient temperature – 20±5 o?, and relative humidity – not exceeding 65%.

Tool name:
PVD HIPIMS plasma deposition device
Area/room:
216
Category:
Thin film deposition
Manufacturer:
Sidrabe Vacuum, Ltd.
Model:
G500M.2
Tool rate:
A

Instructors

Licensed Users

You must be logged in to view tool modes.