View
| RIGAKU X-Ray diffractometer | Characterization | RIGAKU | MiniFlex 600 |
View
| 3D SLA printer Form3+ | Other processes | Formlabs | Form3+ |
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| A kit of spatial light modulators | Other processes | Holoeye | PLUTO-2-VIS-014 (Phase) and HES-6001 (Amplitude) |
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| Absorptiometer Specord 210 | Spectroscopy | Analytikjena | Specord 210 |
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| AFM Veeco CPII | Characterization | Veeco | CP-II |
View
| ALD Savannah | Thin film deposition | Veeco | Savannah S100 |
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| Analytical balance ABJ/ABS-N | Other processes | Kern | ABJ 120-4NM |
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| Analytical balance ADB/ADJ | Other processes | Kern | ADB 100-4 |
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| Automation sample rotator | Characterization | J.A.Woollam | W1-12/ASR |
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| Ball mill Retsch MM200 | Other processes | Retsch | MM200 |
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| Battery test stand BTS4000 | Characterization | Neware | 6 x BTS4000-5V50mA-8CH, 1 x BTS4000-5V12A-8CH |
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| Battery test station BioLogic | Characterization | BioLogic | VMP3 |
View
| Centauri Power/Energy Meter block | Characterization | Ophir | Centauri Dual Channel meter |
View
| Cleanroom Fogger | Other processes | Applied Physics, Inc | CRF2 |
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| Coin-cell crimper | Other processes | TOB Machine | TOB-MR-120 |
View
| Compact high optical efficiency monochromator ML44 | Spectroscopy | Solar Laser Systems | ML44 |
View
| COMSOL | Other processes | COMSOL | COMSOL 6.1 |
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| Diamond saw | Bonding and packaging | Diamond WireTec | DWS 100 |
View
| Diamond Scriber RV-129 | Other processes | ATV Technologie GmbH | Diamond Scriber RV-129 |
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| Differential scanning calorimetry (DSC)/thermal gravimetry (TG) | Characterization | SETARAM | LABSYS Evo |
View
| Digital Overhead Stirrer | Other processes | IKA | MICROSTAR 7.5 digital |
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| Drop Shape Analyzer DSA25 | Characterization | KRUSS GmbH | Drop Shape Analyzer DSA25 |
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| EBL Raith eLINE | Lithography | Raith | eLINE Plus |
View
| EDS X-ray analyzer | Characterization | EDAX | Eagle III XPL |
View
| Elveflow OB1 pressure controller | Other processes | Elveflow | OB1 MK3+ |
View
| EPR Spectrometer | Spectroscopy | Bruker | Elexsys-II E500 |
View
| Femtosecond laser system | Spectroscopy | LightConversion | PHAROS SP 10W,ORPHEUS-HP Harmonics gen. 2H-4H |
View
| Fourier Transform Infrared Spectrophotometer | Characterization | Shimadzu | Irtracer-100 |
View
| FTIR Vertex 80v | Spectroscopy | Bruker | Vertex 80v |
View
| Fume hood (219) | Other processes | Terra Universal | Ductless Exhaust Purification Hood |
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| Fume hood 114 | Other processes | Terra Universal | Ductless Exhaust Purification Hood |
View
| Fume hood 213 | Other processes | Terra Universal | Ductless Exhaust Purification Hood |
View
| Fume hood 414-1 | Other processes | Laborbau Systeme Hemling GmbH & Co. KG | TA1800 |
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| Fume hood 414-2 | Other processes | Laborbau Systeme Hemling GmbH & Co. KG | TA1800 |
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| Fume hood 514 | Other processes | UAB “LABOCHEMA LT” | CFI-V01 |
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| Fume hood 517-1 | Other processes | UAB “LABOCHEMA LT” | CFI-V02 |
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| Fume hood 517-2 | Other processes | UAB “LABOCHEMA LT” | CFI-V02 |
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| Fume hood 517-3 | Other processes | UAB “LABOCHEMA LT” | CFI-V02 |
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| Fume hood 518-1 | Other processes | UAB “LABOCHEMA LT” | CFI-V02 |
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| Fume hood 518-2 | Other processes | UAB “LABOCHEMA LT” | CFI-V02 |
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| Fume hood 518-3 | Other processes | UAB “LABOCHEMA LT” | CFI-V02 |
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| Fume hood 520 | Other processes | UAB “LABOCHEMA LT” | Purair P5-36-XT(RX) |
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| Fume hood 521 | Other processes | UAB “LABOCHEMA LT” | CFI-V01 |
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| Fume hood acids/bases 116 | Other processes | PM Plast | Fume hood D |
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| Fume hood laminar 116- Left | Other processes | PM Plast | Fume hood B |
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| Fume hood laminar 116-Right | Other processes | PM Plast | Fume hood A |
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| Fume hood solvents 116 | Other processes | PM Plast | Fume hood C |
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| Gas chromatograph | Characterization | Shimadzu | Nexis GC-2030 |
View
| Gas sorption analysis system | Characterization | Hy-Energy | LLC PCTPro-2000 with mass spectrometer RGAPro-100 |
View
| Glove box (517) | Other processes | M. Braun Inertgas-Systeme GmbH | EASYlab workstation |
View
| Glove box 3 | Other processes | Mbraun | Unilab Pro Eco 3 gloves |
View
| Glove box 4 | Other processes | Mbraun | Unilab Pro Eco 4 gloves |
View
| Hall measurement system 5000 | Characterization | Ecopia | HMS-5000 |
View
| He cryostat 512 | Spectroscopy | Janis, Sumitomo | CCS-100/204, HC-4E1 |
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| He leak detector | Characterization | Pfeiffer | ASM 340 |
View
| Heating thermostat | Thermal processes | Lauda | ECO E 10 S |
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| High temperature tube furnace. NR.7 | Thermal processes | Carbolite Gero | HTRH/HTRV |
View
| High Temperature Vacuum Furnace System | Thermal processes | OXY-GON Industries | FR210-25T-M-200-04T |
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| High-temperature furnace 1300 C NR.5. | Thermal processes | Nabertherm | L 9/13 |
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| High-temperature furnace 1400 C NR.1. | Thermal processes | Nabertherm | LHTC 08/14 |
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| High-temperature furnace 1600 C NR.3. | Thermal processes | Nabertherm | LHT 08/16 |
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| High-temperature furnace 1800 C NR.6. | Thermal processes | Nabertherm | LHT 08/18 |
View
| High-temperature furnace 300 C NR.4. | Thermal processes | Nabertherm | TR 60 |
View
| HMDS prime oven | Cleaning and surface preparation | Yield Engineering Systems | YES-310TAE |
View
| Horizontal CVD Reactor | Thermal processes | Carbolite | TG3 12/60/600 |
View
| Hot isostatic press EPSI | Thermal processes | EPSI | HIP 200 – 77*150G |
View
| Induction oven | Thermal processes | Linn High Therm | MKH-4,8 |
View
| Ink-Jet Dimatix Materials Printer | Thin film deposition | Fujifilm | Dimatix Materials Printer DMP-2850 |
View
| Keithley 6514 electrometer | Characterization | Tektronix/Keithley | 6514 |
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| Lab Support | Other processes | ISSP UL | Virtual |
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| Laboratory Balance 0.01 mg (219) | Other processes | Kern | ABT 120-5DNM |
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| LASC | Other processes | DELL & SUPERMICRO | Six Dell EMC C6400 & Six Supermicro SYS-6029TP-HTR |
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| Laser beam profiler Cinogy CMOS-1.001-Nano | Characterization | Cinogy | CMOS-N204-OM + ZB-552 + ZB-652 / 653 / 6 + ZB-412 |
View
| Laser Cutter Nova 24 | Other processes | Thunderlaser | Nova 24 |
View
| Laser Ekpsla NL kHz | Lasers | Ekspla | NL202 |
View
| Laser Ekspla NT ns tunable | Lasers | Ekspla | NT 342/3UV |
View
| Laser Ekspla PL kHz ps tunable | Lasers | Ekspla | PL2210A-1k-SH-TH+PG403-SH #PLD263+PG269 |
View
| Laser Ekspla PL ps tunable | Lasers | Ekspla | PL 2143A/Pre-T; PG 401/SH; HMPL/TH |
View
| Laser Ekspla SL ps powerful | Lasers | Ekspla | SL 312 |
View
| Laser excimer EX10A | Lasers | Gam Laser, Inc. | EX10A |
View
| Laser writer Heidelberg µPG | Lithography | Heidelberg Instruments | µPG 101 |
View
| LD set of equipment | Lasers | Thorlabs | L975P1WJ CW, TCLDM9, LDC220C, TED200C |
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| Lexsyg TL/OSL Reader | Characterization | Freiberg instruments | Lexsygresearch LMS |
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| LIMS Training | Other processes | ISSP UL | CLR |
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| Lumerical | Other processes | ANSYS | 2022 R2.4 |
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| Mask aligner Suss MA6 | Lithography | Suss Microtec | MA/BA6 Gen4 |
View
| Mass-spectrometer portable | Spectroscopy | Ametec | Dycor LC-D |
View
| MFIA 500 kHz / 5 MHz Impedance Analyzer | Characterization | Zurich Instruments AG | MFIA |
View
| Microwave Synthesis System SynthWAVE | Thermal processes | Milestone Srl | SynthWAVE T660 |
View
| Mixer Thinky | Other processes | Thinky Corporation | Mixer ARE 250 |
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| MOCVD | Thin film deposition | Aixtron SE (Germany) | AIX-200RF |
View
| Multifunctional cluster tool SAF | Thin film deposition | Sidrabe | SAF25/50 |
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| Nanoindenter | Characterization | Agilent | G200 |
View
| OAL Support | Other processes | LU CFI | Virtual Tool |
View
| Ophir Power/energy sensor | Characterization | Ophir | 30A-BB-18 |
View
| Ophir pyroelectric energy meter | Characterization | Ophir | PE10-C |
View
| Optical microscope Nikon 150 | Characterization | Nikon | Eclipse LV150N |
View
| Optical microscope Nikon Ci | Characterization | Nikon | Eclipse Ci-Pol |
View
| Optically detected magnetic resonance spectrometer (ODMR) | Spectroscopy | Oxford Instruments | SM4000-8 |
View
| Ossila Dip Coater | Thin film deposition | Ossila | Dip Coater L2006A-0288 |
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| Particle size analysis/density and viscosity meter/surface potential equipment | Characterization | Anton Paar | Litesizer 500 |
View
| PECVD PlasmaPro 100 | Thin film deposition | Oxford Instruments | PlasmaPro 100 PECVD |
View
| pH Meter/Conductometer | Characterization | Metrohm | 914 pH Meter/Conductometer |
View
| Photoluminescence Spectrometer FLS1000 | Spectroscopy | Edinburgh Instruments | FLS1000-DD-stm |
View
| Planetary Mill | Other processes | Fritsch | Pulverisette 5 |
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| Plasma Asher | Cleaning and surface preparation | PVA TePla AG | GIGAbatch 360M |
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| Potentiostat – Galvanostat Autolab | Characterization | Metrohm Autolab | PGSTAT302N |
View
| Probe Station MPS 150 | Bonding and packaging | Form Factor | MPS 1500 |
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| Profiler Dektak 150 | Characterization | Veeco | Dektak 150 |
View
| Profiler Zygo 7100 | Characterization | Zygo | Newview 7100 |
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| Pulsed Laser Deposition | Thin film deposition | Twente Solid State Technology | 1 |
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| PVD HIPIMS plasma deposition device | Thin film deposition | Sidrabe Vacuum, Ltd. | G500M.2 |
View
| Raman spectrometer | Spectroscopy | Spectroscopy & imaging GmbH | TriVista CRS Confocal Raman Microscope (TR777) |
View
| RIE Oxford PP 100 Cobra | Dry etching | Oxford Instruments | PlasmaPro 100 ICP 300 |
View
| Sample preparation system for SEM | Other processes | Buehler | MetaServ 250 |
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| SEM Helios | Electron/Ion microscopy | Thermo Fisher Scientific | Helios 5 UX |
View
| SEM Phenom Pro | Electron/Ion microscopy | Phenom-World | Phenom Pro |
View
| SEM/FIB Tescan Lyra | Electron/Ion microscopy | Tescan | Lyra 3 |
View
| Spectral ellipsometer Woollam RC2 – XI | Characterization | J. A. Woollam Co., Inc. | RC2 – XI |
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| Spectrograph/CCD system | Spectroscopy | Andor Technology Ltd. | Kymer 328i-B1/iStar |
View
| Spectrophotometer Cary 7000 | Spectroscopy | Agilent | Cary 7000 Universal Measurement Spectrophotometer |
View
| Spin coater Laurell WS400 | Lithography | Laurell Technologies | WS-400B-6 NPP/LITE |
View
| Spin coater Laurell WS650 | Thin film deposition | Laurell | WS-650SX-6NPP/LITE |
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| Spin coater Laurell WS650 lithography | Thin film deposition | Laurell Technologies Corporation | WS-650Mz-23NPPB/UD3 |
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| TEM Fei Tecnai | Electron/Ion microscopy | Fei | Tecnai |
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| Test tool 1 | Characterization | ISSP UL | A |
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| Test tool 2 | Lithography | ISSP UL | Test |
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| Thermal evaporator Edwards | Thin film deposition | Edwards | Auto 306 |
View
| Thermal evaporator in GloveBox | Thin film deposition | Moorfield Nanotechnology/Jacomex | MiniLab LT090A-MX/ GP (Concept)-T |
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| Thermal Oven | Thermal processes | Binder | FD56 |
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| Thermogravimetric analyser | Characterization | Shimadzu Corp. | DTG-60 |
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| Thin film deposition and photoelectric measurement system | Thin film deposition | ISSP UL | TFDPMS |
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| Time correlated photon counting system | Spectroscopy | PicoQuant | HydraHarp 400 |
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| Time-resolved spectroscopy tool with streak camera | Spectroscopy | Hamamatsu | Streak Camera C10910-01, Spec. Kymera 328i-B2- |
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| Ultrasonic cleaning unit | Wet chemistry | Elma | Elmasonic S 120 (H) |
View
| Ultrasonic cleaning unit P 60 H | Cleaning and surface preparation | Elma | Elmasonic P 60 H |
View
| Ultrasonic Spray Coater | Thin film deposition | Nadatech Innovations | ND-SP |
View
| Universal Centrifuge | Wet chemistry | HERMLE | Z 306 |
View
| Universal Oven | Thermal processes | Memmert | UF 55 |
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| UV/Ozone cleaner Novascan | Bonding and packaging | Novascan Technologies | PSDP-UV8T |
View
| UV-VIS Spectrophotometer | Characterization | Shimadzu | UV-1900i |
View
| Vacuum Drying Oven | Thermal processes | SHANGHAI YUANHUAI INDUSTRIAL CO.,LTD. | DZF-6020 |
View
| Waterbath | Wet chemistry | MEMMERT | WNB 10 |
View
| Wire bonder F&S | Bonding and packaging | F&S Bondtec | 53xx BDA |
View
| XAS-XEOL | Characterization | Monospektra UAB | UAB |
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| XPS – X-ray photoelectron spectroscopy | Spectroscopy | ThermoFisher | ESCALAB Xi |
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| XRD X'Pert PRO | Characterization | PANalytical | X'Pert Pro Powder |