Picture of ALD Savannah
Current status:
AVAILABLE
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Currently installed precursors: H2O, DEZ, TMA.

Atomic layer deposition system.

Thermal deposition - Substrate temperature: up to 400 oC

Materials available: Al2O3, HfO2, ZnO, AZO, TiO2 

Exposure ModeTM deposits films with ultra high aspect ratio (>2000:1)

Stacks of two materials

Substrate size: 100 mm diameter x 6.4 mm thickness

Ozone generator and Low vapor pressure delivery

Currently installed precursors are suitable for TiO2 and Al2O3 deposition

 

Tool name:
ALD Savannah
Area/room:
CLR - 120
Category:
Thin film deposition
Manufacturer:
Veeco
Model:
Savannah S100
Tool rate:
A

Instructors

Licensed Users

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