Atomic layer deposition system.
Thermal deposition - Substrate temperature: up to 400 oC
Materials available: Al2O3, HfO2, ZnO, AZO, TiO2, MnOx
Exposure ModeTM deposits films with ultra high aspect ratio (>2000:1)
Stacks of two materials
Substrate size: 100 mm diameter x 6.4 mm thickness
Ozone generator and Low vapor pressure delivery
At present, the system is equipped with precursors for TiO2, MnO?, and Al2O3 deposition, but only Al2O3 deposition is immediately available. The other precursors can be enabled upon request (updated on 15.10.2025).