Atomic layer deposition system.
Thermal deposition - Substrate temperature: up to 400 oC
Materials available: Al2O3, HfO2, ZnO, AZO, TiO2
Exposure ModeTM deposits films with ultra high aspect ratio (>2000:1)
Stacks of two materials
Substrate size: 100 mm diameter x 6.4 mm thickness
Ozone generator and Low vapor pressure delivery
Currently installed precursors are suitable for ZnO, Al2O3 and TiO2 deposition (updated on 08.07.2024).